Skip to main content

Joseph Finan Recognized Among ‘Best of Big D: Heroes’

DALLAS – August 3, 2020 – Joseph Finan, patent agent in the Dallas office of global law firm Greenberg Traurig, LLP, has been recognized in a special edition of D Magazine’s “Best of Big D: Heroes.” The publication typically showcases its annual “Best of Big D” issue with the best businesses and services Dallas has to offer. This year the magazine redirected its focus to showcase the Dallas community heroes, with over 900 submissions.

Finan was selected for this honor for giving his time, talents, and resources to join the grassroots effort in the 3-D printing community to help produce and deliver personal protective equipment during the Coronavirus Disease 2019 (COVID-19) pandemic. Finan donated 1,215 cleanable, reusable, face shields and about 1,000 ear savers, which has a market value of about $12,000.

“I am honored to be recognized alongside such an impressive group of individuals,” Finan said. “Thank you to those who supported my endeavor. A special thanks to my Greenberg Traurig colleagues for financing a large portion of the project. Without their support, we wouldn’t have been nearly as successful.”

“Joe’s commitment and passion to helping others is reflected in both his legal work as a patent agent as well as his community involvement. We are incredibly proud of Joe and are grateful to have him as a member of our team,” said Joseph Coniglio, managing shareholder of Greenberg Traurig’s Dallas office.

Finan helps companies protect their intellectual property by drafting patent applications, identifying patentable subject matter, and representing clients before the United States Patent and Trademark Office (USPTO). He knows how to apply the law under both pre-AIA and AIA and has experience with foreign filings and PCT applications. He has extensive knowledge of the Manual of Patent Examining Procedure and is effective at using it to support positions in response to Office actions. Finan is also well-versed in claim interpretation and rejections under 112, as well as the causes and avoidance of critical defects in patent applications.